Electron beam deflection

A study of multifunction device for electron beam deflection and oscillation

多功能电子束偏摆装置的研究

In the design of electron beam deflection system with a large scanning field , determination of aberration is a practical problem .

电子束大扫描场偏转系统设计中，像差的确定是一个必须解决的实际问题。

A flexible programmable electron beam deflection system is proposed which enables an electron beam to be controlled externally to a spot .

设计了一个可编程电子束扫描控制系统，能够使电子束受控的偏摆产生任何图形。

The Theoretical Analysis and Calculation of the Amount of Electron Beam Deflection of an Electrostatic Deflection System Consisting of Triple-deflective Deflection Plates

三斜板系统电子束偏转量的计算

The computation of dynamic correction in electron beam focusing and deflection systems

电子束聚焦和偏转系统中动态修正的计算

Numerical computation of processing error effect of lenses in electron beam focusing and deflection systems

电子束聚焦偏转系统中透镜加工误差效应的数值计算

The structure of the electron beam focusing and deflection system of electron beam exposure machine is analysed with computer aided design ( CAD ) .

并使用计算机辅助设计研究电子束曝光机聚焦偏转系统的结构。

We modified the HITACHI S530 scanning electron microscope adding to it function of external control of electron beam deflection .

我们改装了日立S530型扫描电子显微镜，使之具有外控电子束偏转功能。